Deposition of Silicon Dioxide Films with a Non-Equilibrium Atmospheric-Pressure Plasma Jet

Journal Article · Wed Sep 12 00:00:00 EDT 2001 · Plasma Sources Science and Technology

DOI:https://doi.org/10.1088/0963-0252/10/4/305· OSTI ID:835504

Babayan, S E; Jeong, J Y; Schutze, A; Tu, V J; Moravej, Maryam; Selwyn, G S; Hicks, R F

No abstract prepared.

Research Organization:: University of California, Los Angeles, CA; Los Alamos National Lab., Los Alamos, NM (US)

Sponsoring Organization:: USDOE Office of Environmental Management (EM) (US)

Journal Information:: Plasma Sources Science and Technology, Journal Name: Plasma Sources Science and Technology Vol. 10; ISSN 0963-0252

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54 ENVIRONMENTAL SCIENCES
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ATMOSPHERIC PRESSURE
DEPOSITION
PLASMA JETS
SILICON