Process Tuning of Silica Thin-Film Deposition
Conference
·
OSTI ID:835318
Use of high-resolution deposition-rate monitoring and programmatic control of electron-beam position results in improvements in rate consistency and uniformity of source depletion during SiO2 thin-film deposition by electron-beam evaporation.
- Research Organization:
- Laboratory for Laser Energetics
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FC52-92SF19460
- OSTI ID:
- 835318
- Report Number(s):
- DOE/SF-19460-573; 1501; 2004-48; TRN: US200720%%115
- Resource Relation:
- Conference: Optical Fabrication and Testing, Rochester, NY, 10-13 October 2004, Optical Society of America
- Country of Publication:
- United States
- Language:
- English
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