Raman spectroscopy and x-ray diffraction of PbTiO{sub 3} thin film
- Department of Physics, University of Puerto Rico, San Juan, Puerto Rico 00931-3343 (United States)
- Department of Physics, University of Puerto Rico, San Juan, Puerto Rico 00931-3343 and Indian Institute of Technology, Kanpur (India)
A PbTiO{sub 3} thin film prepared on silicon substrate by sol-gel technique has been studied by micro-Raman spectroscopy and x-ray diffraction (XRD). The spectra, in comparison to the single crystal work, show high background in the low frequency region and Raman lines are broader, thus revealing the polycrystalline nature of the film. The frequencies of the Raman bands in the film are clearly shifted to lower frequencies compared to the corresponding ones in the single crystal or powder forms. This phenomenon is similar to the hydrostatic pressure effect on the Raman lines of PbTiO{sub 3} single crystal. The film, therefore, has grains under stress. This stress is caused by nonequilibrium defects and diffusion at the interface. Measurements at different film positions showed variations in the frequency and width of the Raman bands which are associated with the stress and grain size inhomogeneities. The measured shift in the Raman frequencies suggests grain sizes {le}1 {mu}m. XRD indicates grain size of around 22 nm and an average stress around 1.3 GPa, which was determined using the measured shift for the {ital c}-lattice constant. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.
- DOE Contract Number:
- FG02-91ER75674
- OSTI ID:
- 82232
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 3 Vol. 78; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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