Underpotential deposition of lead on copper(111). A study using a single-crystal rotating ring disk electrode and ex situ low-energy electron diffraction and auger electron spectroscopy

Journal Article · Thu Jun 01 04:00:00 EDT 1995 · Langmuir

DOI:https://doi.org/10.1021/la00006a060· OSTI ID:81347

Brisard, G M; Zenati, E ^[1]; Gasteiger, H A; Markovic, N M; Ross, Jr, P N ^[2]

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1. Universite de Sherbrooke (Canada)
2. Lawrence Berkeley Lab., CA (United States)

The underpotential deposition of Pb was studied on Cu(111) single crystal surfaces prepared both by a novel electropolishing procedure and by sputtering/annealing in ultrahigh vacuum. Identical results were found with both methods. Pb atoms are deposited underpotentially on Cu(111) into a compact nonrotated hexagonal overlayer. The measured Pb coverage at saturation is 53% with respect to the Cu(111) substrate and is identical to the packing density of the (111) plane of bulk Pb. The presence of Cl in the supporting electrolyte has a strong effect on the potential region where deposition/stripping occurs and on the reversibility of the reaction. 43 refs., 8 figs., 1 tab.

• Sponsoring Organization: USDOE
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 81347
• Journal Information: Langmuir, Journal Name: Langmuir Journal Issue: 6 Vol. 11; ISSN LANGD5; ISSN 0743-7463
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
40 CHEMISTRY
AUGER ELECTRON SPECTROSCOPY
COPPER
ELECTRIC POTENTIAL
ELECTROCHEMISTRY
ELECTRODEPOSITION
ELECTRON DIFFRACTION
ELECTROPOLISHING
LEAD
MONOCRYSTALS