Underpotential deposition of lead on Cu(100) in the presence of chloride: Ex-situ low-energy electron diffraction, auger electron spectroscopy, and electrochemical studies
- Universite de Sherbrooke, Quebec (Canada)
- Lawrence Berkeley National Lab., CA (United States)
Electrochemical and ultrahigh vacuum measurements are presented for the underpotential deposition (UPD) of Pb on Cu(100) in the presence of chloride ions. The chemistry is very similar to the for the (111) surface studied previously by the same methods. UPD Pb forms a compact layer of fully discharged atoms having essentially the same density as that in the (100) plane of bulk Pb. The deposition appears to occur via a single process, the nucleation and growth of Pb islands, but other types of growth modes cannot be excluded. The presence of chloride ion in the electrolyte enhances the kinetics of Pb deposition in both the underpotential and overpotential regions and results in a {approx} 0.1 V negative shift in the mean potential for UPD versus that in chloride-free perchloric acid. This shift can be accounted for in a simple thermodynamic model for the total Cu/Pb/Cl system. The only real difference in Pb UPD on the two different Cu crystal faces was the absence of an ordered structure for the compact layer on Cu(100), versus the ordered structure observed on Cu(111). This difference appears to be related to a lower mobility of Pb adatoms due to the greater atomic corrugation of the (100) surface. 32 refs., 7 figs.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 535466
- Journal Information:
- Langmuir, Journal Name: Langmuir Journal Issue: 8 Vol. 13; ISSN 0743-7463; ISSN LANGD5
- Country of Publication:
- United States
- Language:
- English
Similar Records
Effect of anions on the underpotential deposition of Cu on Pt(111) and Pt(100) surfaces
Underpotential deposition of lead on copper(111). A study using a single-crystal rotating ring disk electrode and ex situ low-energy electron diffraction and auger electron spectroscopy
Underpotential Deposition of Cu on Pt(100): Effects of Anions onAdsorption Isotherms and Interface Structures
Journal Article
·
Sun Jan 31 23:00:00 EST 1993
· Langmuir
·
OSTI ID:171446
Underpotential deposition of lead on copper(111). A study using a single-crystal rotating ring disk electrode and ex situ low-energy electron diffraction and auger electron spectroscopy
Journal Article
·
Thu Jun 01 00:00:00 EDT 1995
· Langmuir
·
OSTI ID:81347
Underpotential Deposition of Cu on Pt(100): Effects of Anions onAdsorption Isotherms and Interface Structures
Journal Article
·
Wed Oct 15 00:00:00 EDT 1997
· Electrochimica Acta
·
OSTI ID:901652