Several Technical Measures to Improve Ultra-High and Extreme-High Vacuum
Conference
·
OSTI ID:807887
Achieving UHV/XHV with out high temperature bake outs is becoming essential in many applications. In this study, we investigated the use of inexpensive silica and titanium oxide thin film coatings on UHV/XHV chambers/components to reduce the adsorption of water on the chamber walls. Water can be cracked into oxygen and hydrogen in the material and act as one of the sources of hydrogen. We have also implemented backing of the turbo pump with an ion pump for reducing the vacuum chamber pump down times into UHV/XHV pressure range. The results of these investigations are summarized in this paper.
- Research Organization:
- Thomas Jefferson National Accelerator Facility, Newport News, VA (US)
- Sponsoring Organization:
- USDOE Office of Energy Research (ER) (US)
- DOE Contract Number:
- AC05-84ER40150
- OSTI ID:
- 807887
- Report Number(s):
- JLAB-ACT-03-04; DOE/ER/40150-2430
- Country of Publication:
- United States
- Language:
- English
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