At-Wavelength Interferometry for EUV Lithography

Journal Article · Wed Jul 02 00:00:00 EDT 1997 · Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures

DOI:https://doi.org/10.1116/1.589666· OSTI ID:800637

Tejnil, E ^[1]; Goldberg, K; Lee, S -H; Medecki, H; Batson, P; Denham, P; MacDowell, A; Bokor, J; Attwood, D

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1. LBNL Library

No abstract prepared.

• Research Organization: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
• Sponsoring Organization: USDOE Director, Office of Energy Research (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 800637
• Report Number(s): LBNL--40044; LBNL/ALS--850
• Journal Information: Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures, Journal Name: Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures Journal Issue: 6 Vol. 15
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
INTERFEROMETRY
LAWRENCE BERKELEY LABORATORY