At-wavelength metrologies for extreme ultraviolet lithography
Journal Article
·
· FED Journal
OSTI ID:794533
- LBNL Library
No abstract prepared.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 794533
- Report Number(s):
- LBNL/ALS--1136
- Journal Information:
- FED Journal, Journal Name: FED Journal Vol. 9
- Country of Publication:
- United States
- Language:
- English
Similar Records
At-wavelength detection of extreme ultraviolet lithography mask blank defects
Extreme ultraviolet scanning lithography-supports extension of Moore's law
Generation of spatially coherent light at extreme ultraviolet wavelengths
Journal Article
·
Sat Oct 31 23:00:00 EST 1998
· Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures
·
OSTI ID:800588
Extreme ultraviolet scanning lithography-supports extension of Moore's law
Journal Article
·
Fri Jun 01 00:00:00 EDT 2001
· Future Fab Magazine
·
OSTI ID:822957
Generation of spatially coherent light at extreme ultraviolet wavelengths
Journal Article
·
Fri Jul 19 00:00:00 EDT 2002
· Science
·
OSTI ID:827089