Skip to main content

Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers

Journal Article · Sun Jul 15 04:00:00 EDT 2001 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1381559· OSTI ID:800194

Bajt, Sasa ^[1]; Stearns, Dan G; Kearney, Patrick

LBNL Library

No abstract prepared.

Print

Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 800194

Report Number(s):: LBNL/ALS--13664

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 2 Vol. 90; ISSN JAPIAU; ISSN 0021-8979

Country of Publication:: United States

Language:: English

Similar Records

Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers

Journal Article · Sun Jul 15 00:00:00 EDT 2001 · Journal of Applied Physics · OSTI ID:40277510

Electronic structure and crystalline coherence in Fe/Si multilayers

Journal Article · Tue Nov 30 23:00:00 EST 1999 · Journal of Cluster Science · OSTI ID:800439

Mo/Si/and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

Journal Article · Fri Mar 31 23:00:00 EST 2000 · Applied Optics · OSTI ID:800196

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
LAYERS
MOLYBDENUM
SILICON