Radiation-induced degradation of polyethersulphone films studied by fluorescent x-ray emission spectroscopy

Journal Article · Wed Sep 01 00:00:00 EDT 1999 · Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions

DOI:https://doi.org/10.1016/S0168-583X(99)00463-2· OSTI ID:794632

Kurmaev, Ernst Z ^[1]; Winarski, Robert P; Endo, K; Ida, T; Moewes, Alexander P; Ederer, David L; Pivin, J -C; Shamin, S N; Trofimova, V A; Yarmoshenko, Y M

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1. LBNL Library

No abstract prepared.

• Research Organization: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 794632
• Report Number(s): LBNL/ALS--1526
• Journal Information: Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions, Journal Name: Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions Journal Issue: 4 Vol. 155
• Country of Publication: United States
• Language: English

Related Subjects

38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY
43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
CHEMICAL RADIATION EFFECTS
POLYETHYLENE GLYCOLS
SULFONES
X-RAY FLUORESCENCE ANALYSIS