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High sensitivity actinic detection of native defects on extreme ultraviolet lithography mask blanks

Journal Article · Wed Aug 01 00:00:00 EDT 2001 · Journal of Vacuum Science and Technology B.

DOI:https://doi.org/10.1116/1.1410088· OSTI ID:791204

Yi, Moonsuk ^[1]; Haga, Tsuneyuki; Walton, Chris; Bokor, Jeffrey

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Research Organization:: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)

Sponsoring Organization:: USDOE Director, Office of Science. Office of Basic Energy Studies. Division of Materials Sciences (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 791204

Report Number(s):: LBNL--48868

Journal Information:: Journal of Vacuum Science and Technology B., Journal Name: Journal of Vacuum Science and Technology B. Journal Issue: 6 Vol. 19

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
42 ENGINEERING
DEFECTS
DETECTION
EXTREME ULTRAVIOLET RADIATION
MASKING
SENSITIVITY
SUBSTRATES