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Low-defect reflective mask blanks for extreme ultraviolet lithography

Conference ·
OSTI ID:794623
 [1]; ; ; ; ;
  1. LBNL Library
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No abstract prepared.

Research Organization:
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
794623
Report Number(s):
LBNL/ALS--1515
Country of Publication:
United States
Language:
English

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Related Subjects

42 ENGINEERING
43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
FABRICATION
INTEGRATED CIRCUITS
MASKING
REFLECTIVE COATINGS