High-temperature oxidation of molybdenum disilicide in oxygen

Journal Article · Fri Oct 31 23:00:00 EST 1975 · Prot. Met. (USSR) (Engl. Transl.); (United States)

OSTI ID:7363492

Lavrenko, V A; Glebov, L A; Lugovskaia, E S

The oxidation kinetics of MoSi2 was investigated within the temperature range 600-1200/sup 0/C at an oxygen pressure of 740 torr, where the oxidation rate is very low. Data on the composition of the scale was obtained by petrographic and x-ray phase analysis. The various types of films formed at different temperatures are discussed. The reduction in the weight increase of MoSi2 specimens with increasing temperature is attributed to the volatility of MoO3. Results suggest that the oxidation is controlled by the passage of ions through the vitreous film firmly bonded to the base. At 740 torr and below 1000 G, the oxidation of MoSi2 is presumed to be accompanied by diffusion of oxygen through the scale to the inside, and of molybdenum and silicon ions to the outside.

• Research Organization: Inst. of Problems in Material Science, Kiev.
• OSTI ID: 7363492
• Journal Information: Prot. Met. (USSR) (Engl. Transl.); (United States), Journal Name: Prot. Met. (USSR) (Engl. Transl.); (United States) Vol. 11:1; ISSN PINMA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360205* -- Ceramics
Cermets
& Refractories-- Corrosion & Erosion
CHEMICAL REACTIONS
HIGH TEMPERATURE
LOW PRESSURE
MOLYBDENUM COMPOUNDS
MOLYBDENUM SILICIDES
OXIDATION
SILICIDES
SILICON COMPOUNDS
TRANSITION ELEMENT COMPOUNDS