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Low-pressure sputtering of high-T/sub c/Nb/sub 3/Ge

Journal Article · · J. Low Temp. Phys.; (United States)
DOI:https://doi.org/10.1007/BF00659199· OSTI ID:7353482
A modified technique for the sputtering of high-T/sub c/ Nb/sub 3/Ge using low Ar pressure is reported. The experimental arrangement involved only conventional equipment and ordinary vacuum conditions. Nb/sub 3/Si with the A-15 structure was also prepared in a similar manner.
Research Organization:
Univ. of California, San Diego, La Jolla
OSTI ID:
7353482
Journal Information:
J. Low Temp. Phys.; (United States), Journal Name: J. Low Temp. Phys.; (United States) Vol. 24:1/2; ISSN JLTPA
Country of Publication:
United States
Language:
English