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Analyses of sputtered films of Nb/sub 3/Ge

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.89228· OSTI ID:7224808
The analyses of Nb-Ge films prepared by sputtering with a modified rf arrangement are reported. The results indicate the importance of thermalization of sputtered particles for the formation of the high-transition-temperature compound Nb/sub 3/Ge.
Research Organization:
Argonne National Laboratory, Argonne, Illinois 60439
OSTI ID:
7224808
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 30:10; ISSN APPLA
Country of Publication:
United States
Language:
English