Influence of biased magnetron deposition parameters on amorphous Gd--Co--Cu properties

Journal Article · Fri Dec 31 23:00:00 EST 1976 · J. Vac. Sci. Technol.; (United States)

DOI:https://doi.org/10.1116/1.569105· OSTI ID:7317870

Albert, P A; Guarnieri, C R

Biased magnetron sputtering has been used to deposit amorphous GdCoCu films from a Gd/sub 15/Co/sub 38/Cu/sub 47/ target. The effects of target current, sputtering pressure, and substrate-bias voltage have been determined. The uniaxial anisotropy energy K/sub u/ may be varied from 0.07 x 10/sup 5/ erg/cm/sup 3/ to 4.0 x 10/sup 5/ erg/cm/sup 3/ while the quality factor Q=K/sub u//(2..pi..M/sup 2/) may be varied from 0.6 to 7.9. In varying these parameters the film compositions are maintained at approximately the target composition, while similar parameter variations in diode sputtering engender compositional changes far greater. Thus, it is shown that magnetron sputtering offers a control of film properties that is unattainable with other deposition techniques.

• Research Organization: IBM Research Laboratory, San Jose, California 95193
• OSTI ID: 7317870
• Journal Information: J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 14:1; ISSN JVSTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
640301 -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALLOYS
AMORPHOUS STATE
COBALT ALLOYS
COPPER ALLOYS
DEPOSITION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
FILMS
GADOLINIUM ALLOYS
MAGNETIC PROPERTIES
MAGNETIZATION
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
PHYSICAL PROPERTIES
RARE EARTH ALLOYS
SPUTTERING