Broad area, intense electron beam source for high resolution, high throughput semiconductor lithography

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

DOI:https://doi.org/10.1116/1.586513· OSTI ID:7303030

Hsu, T Y; Hadizad, P; Liou, R L; Baik, M; Roth, G; Gundersen, M A ^[1]; Frank, K ^[2]

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1. Univ. of Southern California, Los Angeles, CA (United States)
2. Univ. of Erlangen (Germany)

Electron beam lithography using a robust, high current density (> 10 A/cm[sup 2]), high brightness (> 10[sup 10] A/m[sup 2] rad [sup 2]), broad area (> 1 cm diam) electron beam source is reported. The electron beam is produced during the hollow cathode discharge phase of a backlighted thyratron. The generated beam propagates in soft vacuum (< 200 mTorr) and is collimated using cylindrical dielectric waveguides, resulting in uniform intensity over an area exceeding approximately 1 cm[sup 2], along with a small divergence angle (< 1.5[degrees]). Masked lithography for replication of fine line structures has been achieved, demonstrating the potential for a high throughput (approximately 30-40 wafers/h), high resolution (< 0.25 [mu]m) lithography system that is competitive with more complex x-ray and short wavelength optical systems. 31 refs., 5 figs.

• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 7303030
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 11:5; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
Ta
42 ENGINEERING
GALLIUM ARSENIDES
RADIATION EFFECTS
SEMICONDUCTOR MATERIALS
MASKING
DIELECTRIC MATERIALS
ELECTRIC DISCHARGES
ELECTRON BEAMS
HOLLOW CATHODES
PMMA
PRINTED CIRCUITS
REPLICA TECHNIQUES
THYRATRONS
VACUUM SYSTEMS
WAVEGUIDES
ARSENIC COMPOUNDS
ARSENIDES
BEAMS
CATHODES
ELECTRODES
ELECTRON TUBES
ELECTRONIC CIRCUITS
ESTERS
GALLIUM COMPOUNDS
GAS DISCHARGE TUBES
LEPTON BEAMS
MATERIALS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PARTICLE BEAMS
PNICTIDES
POLYACRYLATES
POLYMERS
POLYVINYLS
360601* - Other Materials- Preparation &amp; Manufacture
661220 - Particle Beam Production &amp; Handling
Targets- (1992-)
426000 - Engineering- Components
Electron Devices &amp; Circuits- (1990-)