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Period-doubling bifurcation in a plasma reactor

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.106847· OSTI ID:7297242
;  [1]
  1. Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)

We describe the response of an industrial plasma reactor to excitation at varying power levels. When the reactor is excited at low power, rf voltage and current waveforms contain components at multiples of the drive frequency (13.56 MHz) due to the plasma's nonlinear impedance. As power is increased, a transition point is reached and the waveforms change. Above the transition power level, signals at the half-harmonic frequency (6.78 MHz) and its multiples are also present, which is indicative of a period-doubling bifurcation. Above and below the bifurcation point, the dc bias and the etch rate behave quite differently.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
7297242
Journal Information:
Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 60:23; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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