Planar inductively coupled plasmas operated with low and high radio frequencies
Journal Article
·
· IEEE Transactions on Plasma Science
- Los Alamos National Lab., NM (United States)
Planar inductively coupled plasmas (ICP`s) powered with 13.56 MHz radio frequency (RF) are used increasingly by the semiconductor industry for close-coupled etching processes. Two planar ICP`s operated with 0.46 and 13.56 MHz RF are described. Low-pressure argon discharges are compared in the same vacuum chamber. The two planar ICP`s generate nearly identical plasmas, within experimental uncertainties, for similar gas pressures and RF powers. The ICP operation proves significantly easier with low RF frequency.
- OSTI ID:
- 357674
- Journal Information:
- IEEE Transactions on Plasma Science, Vol. 27, Issue 1; Other Information: PBD: Feb 1999
- Country of Publication:
- United States
- Language:
- English
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