Planar inductively coupled plasmas operated with low and high radio frequencies

Journal Article · Sun Jan 31 23:00:00 EST 1999 · IEEE Transactions on Plasma Science

DOI:https://doi.org/10.1109/27.763041· OSTI ID:357674

Tuszewski, M ^[1]

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1. Los Alamos National Lab., NM (United States)

Planar inductively coupled plasmas (ICP`s) powered with 13.56 MHz radio frequency (RF) are used increasingly by the semiconductor industry for close-coupled etching processes. Two planar ICP`s operated with 0.46 and 13.56 MHz RF are described. Low-pressure argon discharges are compared in the same vacuum chamber. The two planar ICP`s generate nearly identical plasmas, within experimental uncertainties, for similar gas pressures and RF powers. The ICP operation proves significantly easier with low RF frequency.

• OSTI ID: 357674
• Journal Information: IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 1 Vol. 27; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
42 ENGINEERING
ETCHING
MANUFACTURING
PLASMA PRODUCTION
RADIOWAVE RADIATION
SEMICONDUCTOR DEVICES