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Computer simulation of the rates and mechanisms of photochemical smog formation

Conference · · Int. J. Chem. Kinet.; (United States)
OSTI ID:7291301

The kinetics and mechanisms of the homogeneous elementary reactions involved in photochemical smog formation were investigated. The rate of reactions in synthetic smog mixture of alkene, alkane, nitric oxide, nitrogen dioxide, carbon monoxide, CH/sub 2/O (formaldehyde), CH/sub 3/CHO (acetaldehyde), methane, and sulfur dioxide exposure to sunlight at z equals 40 deg were simulated by computer calculations. The theoretical effects of initial aldehyde impurity on the ozone and peroxyacetyl nitrate levels reached in these systems require that consideration of the concentrations of aldehyde contaminants be monitored and an account taken of their presence in the further development of control strategy for photochemical oxidant. The theoretical rates and mechanisms of NO/sub 2/ and SO/sub 2/ removal in synthetic smog mixtures are calculated and the nature of the product formed considered. The homogeneous removal paths for both of these gases account for a significant fraction of their rates of removal in real urban atmospheres.

Research Organization:
Ohio State Univ., Columbus
OSTI ID:
7291301
Journal Information:
Int. J. Chem. Kinet.; (United States), Journal Name: Int. J. Chem. Kinet.; (United States) Vol. 7:Suppl. 1; ISSN IJCKB
Country of Publication:
United States
Language:
English