Jet vapor deposition of thin films for solid oxide and other fuel cell applications

Conference · Wed Jan 01 00:00:00 EST 1992

OSTI ID:7280732

Halpern, B L; Schmitt, J J; Golz, J W; Di, Y

JVD has demonstrated promise for thin film SOFC research and fabrication. Micron scale YSZ films made via JVD are dense and pinhole free; they seal highly porous electrode surfaces and are gas tight. There is little chance for impurity incorporation in JVD, and the evidence points to oxygen ion conductivity.

• Research Organization: Jet Process Corp., New Haven, CT (United States)
• Sponsoring Organization: USDOE; USDOE, Washington, DC (United States)
• DOE Contract Number: FG05-91ER81156
• OSTI ID: 7280732
• Report Number(s): DOE/ER/81156-92/C0059; CONF-920748-6; ON: DE92019980
• Resource Relation: Conference: US Department of Energy contractors review meeting on fuel cells, Morgantown, WV (United States), 14-15 Jul 1992
• Country of Publication: United States
• Language: English

Related Subjects

30 DIRECT ENERGY CONVERSION
SOLID ELECTROLYTE FUEL CELLS
CHEMICAL VAPOR DEPOSITION
ARRHENIUS EQUATION
ELECTRIC CONDUCTIVITY
FABRICATION
JETS
OXIDES
THIN FILMS
ZIRCONIUM OXIDES
CHALCOGENIDES
CHEMICAL COATING
DEPOSITION
DIRECT ENERGY CONVERTERS
ELECTRICAL PROPERTIES
ELECTROCHEMICAL CELLS
EQUATIONS
FILMS
FUEL CELLS
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
ZIRCONIUM COMPOUNDS
300501* - Fuel Cells- Design & Development