Time-of-flight atom-probe field-ion microscope for the study of defects in metals

Journal Article · Sat May 01 00:00:00 EDT 1976 · Scr. Metall.; (United States)

DOI:https://doi.org/10.1016/0036-9748(76)90178-2· OSTI ID:7273953

Hall, T M; Wagner, A; Berger, A S; Seidman, D N

An ultra-high vacuum time-of-flight (TOF) atom-probe field-ion microscope (FIM) specifically designed for the study of defects in metals is described. Performance experiments show that this instrument can clearly resolve the seven stable isotopes of molybdenum, the five stable isotopes of tungsten, and the two stable isotopes of rhenium in a tungsten-25 at. percent rhenium alloy. The entire process of applying the evaporation pulse to the FIM specimen, measuring the dc and pulse voltages, and analyzing the TOF data is controlled by a Nova 1220 computer. Using automated system 600 TOF events min/sup -1/ can be recorded and analyzed.

• Research Organization: Cornell Univ., Ithaca, NY
• OSTI ID: 7273953
• Journal Information: Scr. Metall.; (United States), Journal Name: Scr. Metall.; (United States) Vol. 10:5; ISSN SCRMB
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
440300 -- Miscellaneous Instruments-- (-1989)
47 OTHER INSTRUMENTATION
COMPUTERS
CONTROL
DEFECTS
DESIGN
ELEMENTS
ION MICROSCOPES
ION MICROSCOPY
METALS
MICROSCOPES
MICROSCOPY
PROBES
TIME-OF-FLIGHT METHOD
ULTRAHIGH VACUUM