X-ray scattering study of Ag/Si(111) buried interface structures
Journal Article
·
· Physical Review Letters; (United States)
- Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States) Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States) Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
- Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)
Various interface structures formed between Si(111) and a {ital thick} Ag overlayer are investigated by grazing-incidence x-ray diffraction. The (7{times}7) reconstruction of Si(111) is preserved under a room-temperature deposited Ag film. Upon annealing to 250 {degree}C the interface becomes (1{times}1). This is contrasted by the ({radical}3 {times} {radical}3 ){ital R}30{degree} structure formed by annealing a {ital thin} Ag film on Si(111). By depositing a thick Ag film on this ({radical}3 {times} {radical}3 ){ital R}30{degree} Ag/Si(111) surface at room temperature, the ({radical}3 {times} {radical}3 ){ital R}30{degree} reconstruction is suppressed.
- DOE Contract Number:
- AC05-84OR21400; FG02-91ER45439; AC02-76CH00016
- OSTI ID:
- 7272285
- Journal Information:
- Physical Review Letters; (United States), Vol. 68:4; ISSN 0031-9007
- Country of Publication:
- United States
- Language:
- English
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