X-ray scattering study of Ag/Si(111) buried interface structures

Journal Article · Sun Jan 26 23:00:00 EST 1992 · Physical Review Letters; (United States)

DOI:https://doi.org/10.1103/PhysRevLett.68.507· OSTI ID:7272285

Hong, H; Aburano, R D; Lin, D; Chen, H; Chiang, T ^[1]; Zschack, P; Specht, E D ^[2]

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1. Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States) Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States) Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
2. Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)

Various interface structures formed between Si(111) and a {ital thick} Ag overlayer are investigated by grazing-incidence x-ray diffraction. The (7{times}7) reconstruction of Si(111) is preserved under a room-temperature deposited Ag film. Upon annealing to 250 {degree}C the interface becomes (1{times}1). This is contrasted by the ({radical}3 {times} {radical}3 ){ital R}30{degree} structure formed by annealing a {ital thin} Ag film on Si(111). By depositing a thick Ag film on this ({radical}3 {times} {radical}3 ){ital R}30{degree} Ag/Si(111) surface at room temperature, the ({radical}3 {times} {radical}3 ){ital R}30{degree} reconstruction is suppressed.

• DOE Contract Number: AC05-84OR21400; FG02-91ER45439; AC02-76CH00016
• OSTI ID: 7272285
• Journal Information: Physical Review Letters; (United States), Journal Name: Physical Review Letters; (United States) Vol. 68:4; ISSN 0031-9007; ISSN PRLTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360606* -- Other Materials-- Physical Properties-- (1992-)
ANNEALING
COHERENT SCATTERING
DIFFRACTION
ELEMENTS
HEAT TREATMENTS
INTERFACES
METALS
SCATTERING
SEMIMETALS
SILICON
SILVER
SURFACE PROPERTIES
TRANSITION ELEMENTS
X-RAY DIFFRACTION