skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: YBa sub 2 Cu sub 3 O sub 7 nanobridges fabricated by direct-write electron beam lithography

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.107508· OSTI ID:7266737
; ; ; ; ; ;  [1]; ;  [2];  [3]
  1. Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
  2. AT T Bell Laboratories, Murray Hill, New Jersey 07974 (United States)
  3. University of Wisconsin-Madison, ECE Department, Madison, Wisconsin 53706 (United States)

A direct method for nondamaging, nanometer-scale patterning of high {ital T}{sub {ital c}} superconductor thin films is presented. We have fabricated superconducting nanobridges in high-quality, epitaxial thin-film YBa{sub 2}Cu{sub 3}O{sub 7} (YBCO) by combining direct-write electron beam lithography and an improved aqueous etchant. Weak links with both length and width dimensions less than 20 nm have exhibited critical currents at 77 K of 4--20 {mu}A and {ital I}{sub {ital c}R{ital n}} products of 10--100 {mu}V which compare favorably with results for other YBCO junction technologies. We have used this technique in the fabrication of a shock-wave pulse former as an initial demonstration of its applicability to monolithic superconductive electronics.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
7266737
Journal Information:
Applied Physics Letters; (United States), Vol. 61:13; ISSN 0003-6951
Country of Publication:
United States
Language:
English