PECVD of amorphous nickel--phosphorus films

Conference · Thu Dec 31 23:00:00 EST 1987

OSTI ID:7248635

Hays, A K; Nelson, G C; Seager, C H

We have developed a plasma deposition technique capable of producing amorphous transition metal-metalloid coatings. The technique consists of decomposing gas mixtures containing transition metal carbonyls and metalloid hydrides in a radiofrequency discharge. Nickel-phosphorus was chosen as a proof-of-principle film for this work. The key to obtaining amorphous metals, as opposed to amorphous metal oxides, lies in the use of a hydrogen carrier gas to remove unwanted oxygen in the form of water as a gaseous by-product. In addition it was discovered that carbon could be completely removed from these films by heating the substrates slightly above room temperatures. 1 ref.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 7248635
• Report Number(s): SAND-88-0221C; CONF-880383-2; ON: DE88011088
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
360603 -- Materials-- Properties
ALLOYS
AMORPHOUS STATE
CARBON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
DEPOSITION
DOCUMENT TYPES
ELECTRIC CHARGES
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELEMENTS
ENERGY TRANSFER
FILMS
HEAT TRANSFER
HEAT TREATMENTS
HYDROGEN
NICKEL ALLOYS
NONMETALS
OXYGEN
PARTIAL PRESSURE
PHOSPHORUS ADDITIONS
PHYSICAL PROPERTIES
PLASMA
REMOVAL
REVIEWS
SURFACE COATING