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Title: Formation of amorphous metal alloys by chemical vapor deposition

Patent ·
OSTI ID:6164502

Amorphous alloys are deposited by a process of thermal dissociation of mixtures of organometallic compounds and metalloid hydrides,e.g., transition metal carbonyl, such as nickel carbonyl and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit. 1 fig.

Research Organization:
AT and T Technologies, Inc., Greensboro, NC (USA)
DOE Contract Number:
AC04-76DP00789
Assignee:
US Dept. of Energy
Patent Number(s):
PATENTS-US-A7170228
Application Number:
ON: DE89010115
OSTI ID:
6164502
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English