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Characterization and comparison of optically transparent conducting films

Technical Report ·
DOI:https://doi.org/10.2172/7248244· OSTI ID:7248244
 [1]
  1. Harvard Univ., Cambridge, MA (USA)
Textured tin oxide films with high light-trapping efficiency, high electrical conductivity and high transparency were successfully grown at high rates by chemical vapor deposition. This process has achieved large-scale commercial production of substrates for amorphous silicon solar cells. Highly transparent and highly conductive films of fluorine-doped zinc oxide were formed by a new CVD process. Increases in the texture (light-trapping) and growth rate are needed to make this a practical process for making substrates for solar cells. Decreases in deposition temperature are needed to make successful back contacts. A hybrid TCO consisting of textured tin oxide covered with a thin, smooth fluorine-doped zinc oxide layer combines the best features of these two materials. It shows efficient light-trapping because of the textured tin oxide, combined with the good resistance of zinc oxide to the hydrogen plasma used to deposit the amorphous silicon. Highly conductive and reflective titanium nitride was deposited under conditions mild enough to form back contacts on amorphous silicon solar cells. Actual cells will be coated and tested in the next contract period. Further optimization of the deposition conditions for these materials should be carried out in collaboration with solar cell manufacturers. 41 refs., 31 figs., 7 tabs.
Research Organization:
Solar Energy Research Inst., Golden, CO (USA)
Sponsoring Organization:
DOE/CE
DOE Contract Number:
AC02-83CH10093
OSTI ID:
7248244
Report Number(s):
SERI/TP-211-3666; ON: DE90000319
Country of Publication:
United States
Language:
English