Method of using polysilane positive photoresist materials
New polysilane copolymers comprise recurring units of --Si(X)(Y)-- and Si(A)(B)--, Si(X)(Y) being different from Si(A)(B), wherein X and Y together have 1-13 carbon atoms, and X and Y each independently is hydrogen, alkyl, cycloalkyl, phenyl, alkylphenyl, or phenylalkyl, with the proviso that only one of X and Y contains a phenyl moiety, or together X and Y are an alkylene group forming a ring with the adjoining Si atom, and wherein A and B together have 3-13 carbon atoms, and A and B each independently is alkyl or cycloalkyl, with the proviso (a) that when one of A and B is ethyl, the other is not methyl or ethyl, and (b) that when one of A ad B is n-propyl and the other is methyl, X and Y are not both methyl. Corresponding homopolysilanes are also provided. Upon ultraviolet irradiation, they photodepolymerize to form volatile products. As a result, they represent a new class of photoresists which enable direct formation of a positive image eliminating the heretofore required development step.
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- US 4587205; A
- Application Number:
- PPN: US 6-676148
- OSTI ID:
- 7245320
- Country of Publication:
- United States
- Language:
- English
Similar Records
Polysilane positive photoresist materials and methods for their use
Polysilane positive photoresist materials and methods for their use
Related Subjects
400500 -- Photochemistry
42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
DECOMPOSITION
DEPOLYMERIZATION
HYDRIDES
HYDROGEN COMPOUNDS
MASKING
MATERIALS
MOLECULAR STRUCTURE
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
SEMICONDUCTOR MATERIALS
SILANES
SILICON COMPOUNDS