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The growth, structure, and mechanical properties of TiN/V[sub x]Nb[sub 1[minus]x]N superlattice thin films

Thesis/Dissertation ·
OSTI ID:7236497
The growth, structure, and mechanical properties of epitaxial TiN/V[sub x]Nb[sub 1[minus]x]N superlattice thin films was investigated. An ultra-high vacuum, magnetron sputtering system was designed and constructed for the deposition and in-situ LEED/AES analysis of nitride superlattice films. The system was characterized to determine the conditions under which epitaxial, stoichiometric TiN, VN, and NbN films could be deposited on MgO(100) substrates at T [approximately] 700[degrees]C. Epitaxial TiN/V[sub x]Nb[sub 1[minus]x]N superlattices were deposited on MgO(100) substrates, where the lattice-mismatch ([delta]) was [approximately] 0.3% for x = 0.6 and [delta] [approximately] 1.7% for x = 0.3. The former [delta] value allowed for a determination of the mechanical properties for an almost strain-free superlattice. The latter value of [delta] [approximately] 1.7% introduces a significant amount of strain into the superlattice, yet it is lower than that of previously studied TiN/VN and TiN/NbN superlattices; this increases the [lambda] range over which coherency strains are present. Structural analysis of the superlattices through techniques such as XRD, XTEM, and LEED shows that the superlattices are epitaxial and that a strong composition modulation is present. Two to ten orders of superlattice satellite reflections were observed, depending on [lambda]. The maximum hardness enhancement (H[sub max]) was [approximately] 75% for the x = 0.3 superlattices, while it was [approximately] 50% for the almost lattice-matched x = 0.6 superlattices. The difference in H[sub max] between the two systems can be attributed to differences in coherency strains. Extensive elastic property measurements show that there are no elastic anomalies in the [lambda] region in which the hardness enhancements are observed.
Research Organization:
Northwestern Univ., Chicago, IL (United States)
OSTI ID:
7236497
Country of Publication:
United States
Language:
English