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Title: Electron and hole drift mobility in amorphous silicon

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.89539· OSTI ID:7211196

Electron and hole drift mobility have been measured in n- and p-type amorphous Si Schottky-barrier solar cells. At room temperature ..mu../sub d n/= (2--5) x 10/sup -2/ cm/sup 2//V sec and ..mu../sub d p/= (5--6) x 10/sup -4/ cm/sup 2//V sec. Both mobilities are trap controlled with ..delta..E=0.19 eV for electrons and ..delta..E=0.35 eV for holes above 250 /sup 0/K and ..delta..E=0.16 and 0.26 eV, respectively, below 250 /sup 0/K. Majority-carrier lifetimes are estimated to be 1 ..mu..sec for electrons and 25 ..mu..sec for holes.

Research Organization:
RCA Laboratories, Princeton, New Jersey 08540
OSTI ID:
7211196
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 31:11
Country of Publication:
United States
Language:
English