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A pulsed-mode, high intensity, heavy negative ion source

Journal Article · · Review of Scientific Instruments; (United States)
DOI:https://doi.org/10.1063/1.1142909· OSTI ID:7206719
 [1]
  1. Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tennessee 37831-6368 (United States)
A high intensity, plasma-sputter, negative ion source, which utilizes multicusp, magnetic-field, plasma confinement techniques is described. The source is an axial-geometry version of a radial-geometry source which has demonstrated a pulsed-mode peak intensity level of several mA for a wide spectrum of heavy negative ion species. The mechanical design features include provisions for fast interchange of sputter samples, ease of maintenance, direct cooling of the discharge chamber, and the use of easily replaced coaxial LaB{sub 6} cathodes.
DOE Contract Number:
AC05-84OR21400
OSTI ID:
7206719
Journal Information:
Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 63:4; ISSN RSINA; ISSN 0034-6748
Country of Publication:
United States
Language:
English

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