Design aspects for a pulsed-mode, high intensity, heavy negative ion source
Conference
·
OSTI ID:6943980
A high-intensity, plasma-sputter, negative ion source, which utilizes multi-cusp, magnetic-field, plasma-confinement techniques, has been designed at the Oak Ridge National Laboratory (ORNL). The source is an axial-geometry version of the radial-geometry source which has demonstrated pulsed-mode peak intensity levels of several mA for a wide spectrum of heavy negative ion species. The mechanical design features include provisions for fast interchange of sputter samples, ease of maintenance, direct cooling of the discharge chamber, and the use of easily replaced coaxial LaB{sub 6} cathodes. 13 refs., 3 figs., 1 tab.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- Sponsoring Organization:
- DOE/ER
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 6943980
- Report Number(s):
- CONF-900603-5; ON: DE90012205
- Country of Publication:
- United States
- Language:
- English
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