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Effects of thermal annealing on superconducting Nb and NbN films

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.575559· OSTI ID:7202386
Thermal annealing in a nitrogen atmosphere degrades the superconducting properties of sputtered Nb and NbN films. Nb film degrades because oxygen atoms diffuse into the grain as interstitial impurities. The effect of this diffusion is suppressed in rapid thermal annealing for 10 s. NbN film degrades due to the release of nitrogen from the NbN lattice and the transformation to the epsilon-NbN phase. Oxygen seems to quicken this degradation and to act as a catalyst in this transformation.
Research Organization:
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, Japan
OSTI ID:
7202386
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:4; ISSN JVTAD
Country of Publication:
United States
Language:
English

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