Molecular beam studies of a gas-surface reaction: Dynamics of laser-induced chemical etching of Si(111) by chlorine
Journal Article
·
· Journal of Physical Chemistry; (USA)
OSTI ID:7197565
- Fudan Univ., Shanghai (China)
Laser-induced chemical etching of Si(111) surface with molecular chlorine is investigated by use of a CW supersonic molecular beam under 355- and 560-nm pulsed laser irradiation. Two major desorbed reaction products, SiCl and SiCl{sub 2}, are observed by time-resolved mass spectrometry. The time-of-flight (TOF) spectra of the desorbed species are measured as a function of laser fluence and the translational energy of the incident chlorine molecules. The measured TOF spectra can be fitted to a Maxwell-Boltzmann distribution at laser fluences lower than 120 mJ/cm{sup 2}. The enhancement of the laser-induced gas-surface reaction on raising the normal component of the translational energy of the chlorine molecules is obvious for both laser wavelength cases. A reaction mechanism that mainly involves the dissociative chemisorption of Cl{sub 2}, the reaction of the adsorbed species, and the laser-induced desorption on the surface is proposed.
- OSTI ID:
- 7197565
- Journal Information:
- Journal of Physical Chemistry; (USA), Journal Name: Journal of Physical Chemistry; (USA) Vol. 93:14; ISSN 0022-3654; ISSN JPCHA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360603* -- Materials-- Properties
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
400400 -- Electrochemistry
BEAMS
CHLORINE
DATA
DATA ANALYSIS
ELEMENTS
ETCHING
EXPERIMENTAL DATA
HALOGENS
INFORMATION
LASERS
MATERIALS
MEASURING INSTRUMENTS
MEASURING METHODS
MOLECULAR BEAMS
NONMETALS
NUMERICAL DATA
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILICON
SURFACE FINISHING
360603* -- Materials-- Properties
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
400400 -- Electrochemistry
BEAMS
CHLORINE
DATA
DATA ANALYSIS
ELEMENTS
ETCHING
EXPERIMENTAL DATA
HALOGENS
INFORMATION
LASERS
MATERIALS
MEASURING INSTRUMENTS
MEASURING METHODS
MOLECULAR BEAMS
NONMETALS
NUMERICAL DATA
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILICON
SURFACE FINISHING