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Magnetic properties and microstructure of bias-sputtered CoZr films

Journal Article · · IEEE Translation Journal on Magnetics in Japan (Institute of Electrical and Electronics Engineers); (USA)
This paper presents an investigation of the effects of a negative bias voltage during film preparation on both the magnetic properties and microstructure of CoZr films deposited by rf magnetron sputtering. A low coercive force H{sub c} and high permeability {mu} are obtained when negative bias voltages lower than {minus}75 V are applied. Values of the magnetostriction constant {lambda}{sub s} for bias-sputtered films are smaller than those for unbiased films. The {mu} value for bias-sputtered films after 1000 hours of heat treatment at 90:0080{degrees}C decreases to approximately 90:0080% of its initial value, while a decrease of about 40% is observed for unbiased films. The decrease in {lambda}{sub s} values and the improvement in stability of the permeability can be explained in terms of the structural difference between films sputtered with and without a bias voltage applied. It is concluded that bias-sputtered films with a negative bias voltage below {minus} 75 V are excellent candidates for use as thin film head pole pieces.
OSTI ID:
7173374
Journal Information:
IEEE Translation Journal on Magnetics in Japan (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Translation Journal on Magnetics in Japan (Institute of Electrical and Electronics Engineers); (USA) Vol. 3:2; ISSN ITJJE; ISSN 0882-4959
Country of Publication:
United States
Language:
English