Effect of sputtering parameters on the magnetic properties of Mo-Permalloy

Journal Article · Tue Nov 15 04:00:00 EST 1988 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.342269· OSTI ID:6728851

Zhang, Z S; Yang, L; Yang, C S; Cai, B C

Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic properties, of FeNiMo sputtered films have been investigated. The magnetic anisotropy field H/sub k/ was found to decrease with the raising preheating temperature while coercivity H/sub c/ presented the contrary trend. High effective permeability can be acquired at low argon pressure, adequate preheating temperature, and bias voltage. Close relationships among effective permeability, anisotropy field, magnetostriction coefficient, and half-height width ..delta..theta/sub 50/ were found. Annealing is available for increasing effective permeability.

• Research Organization: Department of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, People's Republic of China
• OSTI ID: 6728851
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:10; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104* -- Metals & Alloys-- Physical Properties
ALLOYS
ANNEALING
ARGON
ELEMENTS
FILMS
FLUIDS
GASES
HEAT TREATMENTS
IRON ALLOYS
MAGNETIC PROPERTIES
MAGNETIC SUSCEPTIBILITY
MOLYBDENUM ALLOYS
NICKEL ALLOYS
NONMETALS
PERMALLOY
PHYSICAL PROPERTIES
PRESSURE DEPENDENCE
RARE GASES
SPUTTERING
THIN FILMS