Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Influence of ion implantation and the adsorption of molecular oxygen on the composition of surface layers and the work function of molybdenum and tungsten

Journal Article · · Dokl. Phys. Chem. (Engl. Transl.); (United States)
OSTI ID:7173235

The authors used x-ray photoelectron spectroscopy (XPS) to investigate the influence of ion implantation and the adsorption of molecular oxygen at 300/sup 0/K on the composition of surface layers (with thicknesses up to 3 nm) of Mo(110) and W(110). The changes in the work function ..delta.. phi occurring as a result of these processes were determined by finding the threshold for the emission of secondary electrons upon their excitation by x radiation. All the experiments, which included the cleaning of the surfaces by Ar/sup +/ ions, the ion implantation of O/sub 2//sup +/, the adsorption of O/sub 2/, the analysis of the composition of the surface layers by XPS, and the determination of ..delta.. phi were carried out in situ in the ultrahigh-vacuum changer of a Leybold-Heraeus LHS-10 electron spectrometer.

Research Organization:
M. V. Lomonosov Moscow Institute of Fine Chemical Engineering (USSR)
OSTI ID:
7173235
Journal Information:
Dokl. Phys. Chem. (Engl. Transl.); (United States), Journal Name: Dokl. Phys. Chem. (Engl. Transl.); (United States) Vol. 294:1-3; ISSN DKPCA
Country of Publication:
United States
Language:
English