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Photochemical synthesis of disilane from silane with infrared laser radiation

Journal Article · · Journal of Physical Chemistry; (USA)
DOI:https://doi.org/10.1021/j100352a019· OSTI ID:7171082
 [1];  [2]
  1. Amoco Technology Co., Naperville, IL (USA)
  2. Los Alamos National Lab., NM (USA)
The authors report the clean and efficient conversion of silane to disilane by CO{sub 2} laser irradiation. The direct irradiation of pure silane at high pressures (from 75 to 1,700 Torr) converts silane to disilane with high selectivity and with efficient use of the absorbed laser radiation. Hydrogen is the only other major volatile product, and the production of solid products is minimal. The proposed mechanism of the photochemical reaction includes (1) collisionally enhanced absorption of the laser radiation by silane, (2) collisional deexcitation of the vibrationally excited silane, (3) concurrent decomposition to SiH{sub 2} and H{sub 2}, (4) production of vibrationally excited disilane by SiH{sub 2} insertion into a silane Si-H bond, (5) collisional quenching of the excited disilane, and (6) rapid cooling of the irradiated gas by thermal expansion. They support the proposed mechanism by additional experiments and model calculations.
OSTI ID:
7171082
Journal Information:
Journal of Physical Chemistry; (USA), Journal Name: Journal of Physical Chemistry; (USA) Vol. 93:15; ISSN 0022-3654; ISSN JPCHA
Country of Publication:
United States
Language:
English