Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Wire chamber aging with CF/sub 4//isobutane and argon/ethane mixtures

Conference · · IEEE Trans. Nucl. Sci.; (United States)
OSTI ID:7145698

Using several identical test cells, the authors investigated the aging characteristics of CF/sub 4//Isobutane (80:20) and Argon/Ethane (50:50). The gas gain and gas flow rate were varied and the measurements extended beyond 6 Coulomb/cm of wire (C/cm). Study of a third gas mixture Ar/Eth/CF/sub 4/ (48:48:4) is at an early stage. The Ar/Eth mixture has shown a variety of problems including cathode foil etching, anode deposits, dark currents and pulse height degradation. In contrast the CF/sub 4//Iso mixture produced some cathode etching for low flow velocities and only very minor anode deposits. With very little pulse height degradation or dark current this mixture is an excellent candidate for a high rate chamber. A small area MWPC using this mixture has been evaluated in a pion beam with particle fluxes up to 3x10/sup 7/ particles/cm/sup 2/-sec.

Research Organization:
TRIUMF, 4004 Wesbrook Mall, Vancouver, B.C. (CA)
OSTI ID:
7145698
Report Number(s):
CONF-871006-
Journal Information:
IEEE Trans. Nucl. Sci.; (United States), Journal Name: IEEE Trans. Nucl. Sci.; (United States) Vol. 35:1; ISSN IETNA
Country of Publication:
United States
Language:
English