Chemistry of copper CVD precursors on a Pt(111) surface
We have investigated the chemistry of Cu(hfac)[sub 2], (hfac)Cu(VTMS), (hfac)Cu(2-butyne), and hfach on a Pt(111) surface. In contrast to what is observed on copper surfaces. Cu(hfac)2 and hfach lead to the formation of distinctly different adsorbed hfac species on Pt(111). This shows the importance of the copper atoms themselves in determining the surface chemistry of copper [beta]-diketonate CVD precursors. The hfac species on Pt(111) are considerably less stable than hfac on copper, suggesting that unimolecular decomposition may lead to impurity incorporation in the interfacial region when copper is deposited onto a more reactive substrate. In situ CVD studies with Cu(I) [beta]-diketonates show that the bimolecular disproportionation reaction leading to copper CVD is favored over unimolecular precursor decomposition at pressures above approximately 10[sup [minus]5] torr.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- DOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 7140932
- Report Number(s):
- SAND-92-2298C; CONF-9210220--1; ON: DE93003250
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360101* -- Metals & Alloys-- Preparation & Fabrication
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COPPER
DEPOSITION
ELEMENTS
HYDRIDES
HYDROGEN COMPOUNDS
KETONES
METALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
ORGANIC SILICON COMPOUNDS
PRECURSOR
SILANES
SILICON COMPOUNDS
SURFACE COATING
TRANSITION ELEMENTS