Copper CVD chemistry on a reactive substrate: Cu(hfac)[sub 2] and hfacH on Pt(111)
- Sandia National Labs., Albuquerque, NM (United States)
The chemistry of the copper CVD precursor Cu(hfac)[sub 2] and of the related hfacH molecule on the Pt(111) surface has been investigated using vibrational (FTIR) spectroscopy, thermal desorption measurements, and Auger spectroscopy. At high coverages, Cu(hfac)[sub 2] adsorption leads to the formation of a [open quotes]standing-up[close quotes] hfac [OC(CF[sub 3])CHC(CF[sub 3])O], adsorbed with its OCCCO skeleton essentially perpendicular to the surface. In the case of hfacH adsorption, and also for lower coverages of Cu(hfac)[sub 2], a different surface species is formed that is tentatively identified as [open quotes]lying-down[close quotes] hfac, i.e., hfac adsorbed with the OCCCO plane essentially parallel to the surface. The hfac species begin to decompose below 300 K. In the case of a saturated layer of hfacH, a large mass 69 (CF[sub 3][sup +]) thermal desorption signal is observed centered near 295 K, accompanied by the formation on the surface of both carbon monoxide and fluorine containing fragments. The carbon monoxide desorbs near 430 K, with nearly simultaneous HF desorption. Above this temperature, only two fluorocarbon species are present on the surface in significant concentration. The first (unidentified) fragment is characterized by an intense CF stretch near 1250 cm[sup [minus]1]. Between 450 and 750 K it converts to adsorbed CF[sub 2], which desorbs or decomposes below 850 K. 36 refs., 10 figs., 1 tab.
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5576431
- Journal Information:
- Journal of Physical Chemistry; (United States), Journal Name: Journal of Physical Chemistry; (United States) Vol. 97:44; ISSN JPCHAX; ISSN 0022-3654
- Country of Publication:
- United States
- Language:
- English
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Chemistry of copper CVD precursors on a Pt(111) surface
Chemistry of copper CVD precursors on a Pt(111) surface
Related Subjects
400102 -- Chemical & Spectral Procedures
400201* -- Chemical & Physicochemical Properties
AUGER ELECTRON SPECTROSCOPY
CARBON COMPOUNDS
CARBON MONOXIDE
CARBON OXIDES
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COMPLEXES
COPPER
COPPER COMPLEXES
DEPOSITION
DESORPTION
ELECTRON SPECTROSCOPY
ELEMENTS
FLUORINE COMPOUNDS
HALOGEN COMPOUNDS
HYDROFLUORIC ACID
HYDROGEN COMPOUNDS
INFRARED SPECTRA
INORGANIC ACIDS
METALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
ORGANOMETALLIC COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PLATINUM
PLATINUM METALS
SORPTION
SPECTRA
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENT COMPLEXES
TRANSITION ELEMENTS