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U.S. Department of Energy
Office of Scientific and Technical Information

High-efficiency thin-film GaAs solar cells. Interim report No. 1, 1 Jan--31 Mar 1976

Technical Report ·
OSTI ID:7119592
A program to develop gallium arsenide (GaAs) thin films with grain sizes suitable for low-cost high-efficiency solar cell application has been initiated. The approach is a recrystallization of evaporated thin germanium (Ge) films on low-cost metal substrates by means of scanning focused beams of energy using quartz-iodide lamps, lasers, and electron sources. The layer of Ge will then be used as a substrate for chemical vapor deposition of GaAs using either the organometallic or halide transport techniques. The materials cost of thin-film GaAs solar cells are predicted for a silicon steel substrate and a nickel/iron substrate. Also discussed is a design for the recrystallization apparatus, a low-cost profilometer which has been built for surface roughness and layer thickness measurements, a modification in the Vac-Ion evaporation system which allows a considerably higher throughput for AMOS solar cell fabrication and plans for the following period.
Research Organization:
Jet Propulsion Lab., Pasadena, CA (USA)
OSTI ID:
7119592
Report Number(s):
PB-255821
Country of Publication:
United States
Language:
English