Patterned deposition of copper on poly(tetrafluoroethylene)

Journal Article · Mon Jun 01 00:00:00 EDT 1992 · Journal of the Electrochemical Society; (United States)

DOI:https://doi.org/10.1149/1.2069498· OSTI ID:7113411

Rye, R R ^[1]; Chi, K M; Hampden-Smith, M; Kodas, T T ^[2]

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1. Sandia National Labs., Albuquerque, NM (United States)
2. New Mexico Univ., Albuquerque, NM (United States)

This paper reports on a three step process that has been developed for patterned deposition of Cu onto poly(tetrafluoroethylene) (PTFE). The first step involves patterned irradiation with low doses of x-rays of electrons which cross-link the PTFE surface; step tow involves chemical etching with the result that only the nonirradiated, noncross-linked areas are etched; and step three involves selective chemical vapor deposition (CVD) of Cu onto the etched surface at 200{degrees} C using (hexafluoroacetylacetonato) Cu(l) trimethylphosphine (hfac) Cu(PMe{sub 3}). The nonirradiated surface is a activated for selective Cu CVD by the chemical etching step, while the irradiated portions remain unactivated due to cross-linking. Continuous Cu films with resistivities of 4 {mu}ohm-cm are formed on the nonirradiated areas. X-ray photoelectron spectra show the nonirradiated areas of the surface to be covered by pure Cu with only surface impurities resulting from air transfer of the samples, while the irradiated areas show the presence of only C and F, characteristic of PTFE.

• Sponsoring Organization: National Science Foundation (NSF); National Science Foundation, Washington, DC (United States)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 7113411
• Journal Information: Journal of the Electrochemical Society; (United States), Vol. 139:6; ISSN 0013-4651
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
74 ATOMIC AND MOLECULAR PHYSICS
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
COPPER
THIN FILMS
POLYTETRAFLUOROETHYLENE
SUBSTRATES
ETCHING
IRRADIATION
X-RAY SPECTRA
CARBON
CHEMICAL VAPOR DEPOSITION
ELECTRON BEAMS
FLUORINE
IMPURITIES
SURFACES
X RADIATION
BEAMS
CHEMICAL COATING
DEPOSITION
ELECTROMAGNETIC RADIATION
ELEMENTS
FILMS
FLUORINATED ALIPHATIC HYDROCARBONS
HALOGENATED ALIPHATIC HYDROCARBONS
HALOGENS
IONIZING RADIATIONS
LEPTON BEAMS
METALS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
ORGANIC POLYMERS
PARTICLE BEAMS
POLYETHYLENES
POLYMERS
POLYOLEFINS
RADIATIONS
SPECTRA
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENTS
665300* - Interactions Between Beams & Condensed Matter- (1992-)
664200 - Spectra of Atoms & Molecules & their Interactions with Photons- (1992-)
400101 - Activation
Nuclear Reaction
Radiometric & Radiochemical Procedures
400400 - Electrochemistry