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Very high atomic oxygen coverages on Ru(001)

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.578100· OSTI ID:7111295
;  [1]
  1. Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973 (United States)

Very high oxygen coverages{minus}up to {theta}{sub {ital O}} {approx} 40 (forty){minus}were obtained by dissociative adsorption of NO{sub 2} on Ru(001) at elevated temperatures. O{sub 2} desorption data show three desorption peaks at {approx}1100, {approx}1000, and {approx}900 K, and suggest strong oxygen--oxygen repulsions in the overlayer. An Arrhenius plot of the leading edge desorption rates of the 900 K peak yields {ital E}{sub {ital A}} = 53 kcal/mol, implying zero-order desorption kinetics. O{sub 2} is the only desorption product for {theta}{sub {ital O}}{lt} 3; additional RuO{sup +}{sub x} ({ital x}=0--3) species were detected at higher coverages. However, neither the O 1{ital s} and Ru 3{ital d} core levels, nor the valence band spectra showed any evidence for chemical changes, i.e., an oxide formation. The process of an underlayer formation as a distinct stage in the oxidation of the Ru metal will be discussed in terms of a model for subsurface penetration of O on transition metals.

DOE Contract Number:
AC02-76CH00016
OSTI ID:
7111295
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:4; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English

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