Reaction of hydrogen with O/Ru(001) and RuO{sub x} films: Formation of hydroxyl and water
- Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973 (United States)
- Department of Chemistry, National University of Singapore, Singapore 119260, The Republic of (Singapore)
The interaction of gas phase atomic hydrogen with chemisorbed oxygen on Ru(001) and RuO{sub x} films has been investigated by means of Auger electron spectroscopy and thermal desorption spectroscopy at surface temperatures between 120 and 320 K. Although molecular hydrogen does not adsorb on oxygen saturated Ru(001) or RuO{sub x} films even at 120 K, atomic hydrogen reacts with oxygen on Ru(001) surfaces, and both D{sub 2} and D{sub 2}O desorb at temperatures below 500 K. The 2D{sub gas}+O{sub ad}{r_arrow}D{sub 2}O{sub gas} reaction is approximately six times faster at 310 K than at 120 K. For RuO{sub x} films, a unity reaction probability was found at oxygen coverages above 3 monolayers (ML), while it decreased to 0.4 at {Theta}{sub 0}{lt}3 ML. Such variation can be attributed to a change in the structure of the oxide film. The reaction probably follows an Eley{endash}Rideal mechanism where gas phase atomic hydrogen reacts with oxygen prior to thermal accommodation within the surface. The desorption of water is the rate limiting step at surface temperatures below 200 K, whereas the formation of water is the rate limiting step at higher temperatures. {copyright} {ital 1997 American Vacuum Society.}
- Research Organization:
- Brookhaven National Laboratory
- DOE Contract Number:
- AC02-76CH00016
- OSTI ID:
- 509013
- Report Number(s):
- CONF-961002--
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 3 Vol. 15; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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