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Radial dependence of silicon KVV and L sub 23 VV Auger matrix elements

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.577978· OSTI ID:7110047
 [1];  [2]
  1. Condensed Matter Theory Division 1151, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
  2. IRC Surface Science, University of Liverpool, Liverpool L69 3BX (United Kingdom)
We present calculations which show the radial dependence of the {ital KVV} and {ital L}{sub 23}{ital VV} Auger matrix elements of silicon. We find greatly differing dependences, converging within {similar to}1 a.u. of the nucleus in the case of the {ital KVV}, but not until {similar to}4 a.u. in the case of the {ital L}{sub 23}{ital VV}, well beyond the bond midpoint of {similar to}2.2 a.u. We also find quite different dependences for the various elements within a particular {ital CVV} transition. Because the local density of states (LDOS) is dependent on the radius of the sphere of integration, our results suggest that different {ital CVV} Auger processes on the same atom in fact probe different LDOSs, as do even different contributions within the same transition. (This effect is separate from the well-known matrix element property which weights angular-momentum components differently.) These results call into question both the single-site LDOS approximation when used in the interpretation of low-energy ({lt}100 eV) Auger spectra, and the application to high-energy spectra of local densities of states obtained by integration over muffin-tin or Wigner--Seitz spheres which have a large radius compared to the region probed by the Auger process. elements
OSTI ID:
7110047
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:4; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English