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Single pulse laser induced reactions of hexafluorobenzene/silane mixtures at 1027 and 944 cm/sup -1 1,2/

Journal Article · · J. Phys. Chem.; (United States)
DOI:https://doi.org/10.1021/j100286a013· OSTI ID:7100929

C/sub 6/F/sub 6//SiH/sub 4/ mixtures were irradiated with a single pulse of a megawatt CO/sub 2/ infrared laser at 1027 and 944 cm/sup -1/, using fluences which ranged from 0.26 to 2.0 J/cm/sup 2/. Neat C/sub 6/F/sub 6/ (7.5 Torr, 1027 cm/sup -1/) underwent decomposition to C/sub 2/F/sub 4/ at a fluence of 0.7 J/cm/sup 2/ with a conversion per flash (CPF) of 4.5%. At 0.3 J/cm/sup 2/ no reaction was observed, setting a fluence threshold for the laser-induced decomposition of C/sub 6/F/sub 6/ between 0.3 and 0.7 J/cm/sup 2/. In the presence of SiH/sub 4/ explosive reactions occurred with conversion of C/sub 2/F/sub 2/ as high as 70%exclamation Different decomposition products were observed depending upon the amount of SiH/sub 2/ present. The observed results are discussed in terms of (a) the low fluence threshold observed for the laser-induced decomposition of C/sub 6/F/sub 6/, (b) the effects that added gases have on the decomposition of C/sub 6/F/sub 6/, (c) the use of C/sub 6/F/sub 6/ as a sensitizer for laser-induced reactions, and (d) the potential for using SiH/sub 4/ for the laser-induced reduction of C-F bonds (C-F + Si-H ..-->.. C-H + Si-F).

Research Organization:
Brandeis Univ., Waltham, MA
OSTI ID:
7100929
Journal Information:
J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 91:2; ISSN JPCHA
Country of Publication:
United States
Language:
English