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Nonspectator electron processes in resonant Auger spectra of SiCl/sub 4/

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:7087710
Angle-resolved photoelectron spectroscopy has been carried out on the valence shell of SiCl/sub 4/ over the range of photon energies from 101.5 to 112.5 eV. Both intensities and angular distribution parameters ..beta.. were monitored over the preionization resonances for silicon 2p. Little effect was seen for emission from the chlorine lone-pair orbitals 2t/sub 1/ , 8t/sub 2/ , and 2e, but striking effects were seen for the bonding 7t/sub 2/ orbital. The resonant behavior was compared with photoabsorption data. The results are discussed in terms of direct participation of the resonantly excited electron and this process compared with spectator electron and shakeup processes.
Research Organization:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6201
OSTI ID:
7087710
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 89:8; ISSN JCPSA
Country of Publication:
United States
Language:
English