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Sputtering of neutral and ionic indium clusters

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.579185· OSTI ID:7079539
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  1. Materials Science, Chemical Technology, and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Secondary neutral and secondary ion cluster yields were measured during the sputtering of a polycrystalline indium surface by normally incident [similar to]4 keV Ar[sup +] ions. In the secondary neutral mass spectra, indium clusters as large as In[sub 32] were observed. In the secondary ion mass spectra, indium clusters up to In[sub 18][sup +] were recorded. Cluster yields obtained from both the neutral and ion channel exhibited a power law dependence on the number of constituent atoms [ital n] in the cluster, with the exponents measured to be [minus]5.6 and [minus]4.1, respectively. An abundance drop was observed at [ital n]=8, 15, and 16 in both the neutral and ion yield distributions, suggesting that the stability of the ion (either secondary ion or photoion) plays a significant role in the observed distributions. In addition, our experiments suggest that unimolecular decomposition of the neutral cluster may also play an important role in the measured yield distributions.
Research Organization:
Argonne National Laboratory (ANL), Argonne, IL
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
7079539
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 12:4; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English