Sputtering of neutral and ionic indium clusters
Journal Article
·
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
- Materials Science, Chemical Technology, and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Secondary neutral and secondary ion cluster yields were measured during the sputtering of a polycrystalline indium surface by normally incident [similar to]4 keV Ar[sup +] ions. In the secondary neutral mass spectra, indium clusters as large as In[sub 32] were observed. In the secondary ion mass spectra, indium clusters up to In[sub 18][sup +] were recorded. Cluster yields obtained from both the neutral and ion channel exhibited a power law dependence on the number of constituent atoms [ital n] in the cluster, with the exponents measured to be [minus]5.6 and [minus]4.1, respectively. An abundance drop was observed at [ital n]=8, 15, and 16 in both the neutral and ion yield distributions, suggesting that the stability of the ion (either secondary ion or photoion) plays a significant role in the observed distributions. In addition, our experiments suggest that unimolecular decomposition of the neutral cluster may also play an important role in the measured yield distributions.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 7079539
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 12:4; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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