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A high resolution electron energy loss spectroscopy study of trimethylgallium decomposition on gallium rich GaAs(100)

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.578083· OSTI ID:7069982
;  [1];  [2]
  1. Department of Chemistry, University of Texas at Austin, Austin, Texas 78712 (United States)
  2. Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
The adsorption and decomposition of trimethylgallium (TMGa) on the gallium rich (4{times}6) and (1{times}6) GaAs(100) surfaces have been studied by high resolution electron energy loss spectroscopy (HREELS), in conjunction with temperature-programmed desorption, x-ray photoelectron spectroscopy, and low energy electron diffraction. TMGa adsorbs molecularly at 108 K and dissociates above 200 K to form monomethylgallium (MMGa) and, possibly, some dimethylgallium surface species. Above 400 K, MMGa dominates. Surface MMGa remains stable until 650 K, above which temperature methyl radicals desorb. HREELS results showed unambiguously that methyl groups remain intact throughout the thermal decomposition of TMGa on GaAs(100). The effect of UV photons on both surface TMGa and MMGa has also been investigated, but no photochemistry was observed at wavelengths longer than 230 nm.
DOE Contract Number:
AC04-76DP00789
OSTI ID:
7069982
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:2; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English